1 : an unexpected intrusion or reduction of linewidth in patterned geometries. may also be a V-shaped intrusion into the perimeter of a wafer. The intrusion is used to align the wafer during process. [SEMATECH] 2 : on a semiconductor wafer, an intentionally fabricated indent of specified shape and dimensions oriented such that the diameter passing through the center of the notch is parallel with a specified low index crystal direction. [SEMI M1-94 and ASTM F1241]
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