1 : a controlled modification of the silicon crystal to draw impurities to the bulk, or to the back surface of the wafer. Contaminants are removed sufficiently far from the front surface, where the devices are built, to render their potential degrading effects negligible. [SEMATECH] 2 : the process that immobilizes impurities at locations away from the region of the specimen to be investigated. [ASTM F1241]
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