l : on polished monocrystalline silicon wafers and test slices cut intentionally off-orientation, the angle between the projection of the vector normal to the wafer surface onto the {111} plane and the projection on that plane of the nearest <110> direction. [SEMI M1-94] 2 : on {100} polished monocrystalline gallium arsenide wafers cut intentionally off-orientation, the angle between the projection of the vector normal to the wafer surface onto the {100} plane and the projection on that plane of the nearest direction. [SEMI M9-90] Also see crystallographic notation.
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