1 : a residual resist that remains on the edge of a substrate after the application process. [SEMATECH] 2 : a thin (3 mm) ring at the edge of the wafer in which photoresist is selectively removed by solvent or exposure. [SEMATECH]
1 : a residual resist that remains on the edge of a substrate after the application process. [SEMATECH] 2 : a thin (3 mm) ring at the edge of the wafer in which photoresist is selectively removed by solvent or exposure. [SEMATECH]