an inert, colorless, and nonflammable gas used in semiconductor processing as an etchant for a variety of films such as silicon, silicon oxide, and silicon nitride. It also is used in resist stripping and as a source of fluoride ions in plasma processes. This gas is a simple asphyxiant (can cause loss of consciousness because of lack of oxygen in the blood). [SEMI C3.40-89] Also called tetrafluoromethane.
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